Handbook of chemical vapor depostion [i.e. deposition] (CVD) principles, technology, and applications / [electronic resource] :

• 作者： Pierson, Hugh O.
• 其他作者：
  • Pierson, Hugh O. Handbook of chemical vapor deposition (CVD)
• 其他題名：
  • Handbook of chemical vapor deposition
  • Materials science and process technology series
• 出版： Norwich, N.Y. : Noyes Publications/William Andrew Pub.
• 版本：2nd ed.
• 叢書名： Materials science and process technology series
• 主題： Chemical vapor deposition--Handbooks, manuals, etc. , Vapor-plating--Handbooks, manuals, etc. , D�ep�ot chimique en phase vapeur--Guides, manuels, etc. , D�ep�ot en phase vapeur--Guides, manuels, etc. , Electronic books.
• ISBN： 9780815514329 、 0815514328
• FIND@SFXID: CGU
• 資料類型: 電子書
• 內容註: Includes bibliographical references and index. Introduction and General Considerations -- Fundamentals of Chemical Vapor Deposition -- The Chemistry of CVD -- Metallo-Organic CVD (MOCVD) -- CVD Processes and Equipment -- The CVD of Metals -- The CVD of the Allotropes of Carbon -- The CVD of Non-Metallic Elements -- The CVD of Ceramic Materials: Carbides -- The CVD of Ceramic Materials: Nitrides -- The CVD of Ceramic Materials: Oxides -- The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides) -- CVD in Electronic Applications: Semiconductors -- CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers -- CVD in Optoelectronic and Ferroelectric Applications -- CVD in Optical Applications -- CVD in Wear- and Corrosion-Resistant Applications -- CVD in Cutting-Tool Applications -- CVD in Fiber, Powder, and Monolithic Applications -- Conversion Guide -- Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification -- Index. Rev. ed. of: Handbook of chemical vapor deposition (CVD), c1992.
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• 摘要註: Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
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