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Reliability wearout mechanisms in advanced CMOS technologies
- 其他作者：
- 出版： Piscataway, NJ :Hoboken, NJ : IEEE Press ;Wiley
- 叢書名： IEEE Press series on microelectronic systems
- 主題： Metal oxide semiconductors, Complementary--Reliability.
- ISBN： 9780471731726 (hbk.) 、 0471731722 (hbk.) 、 9780470455265 、 0470455268
- 資料類型: 圖書
- 內容註: Includes bibliographical references and index. Introduction / Alvin W. Strong -- Dielectric characterization and reliability methodology / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Suñé -- Dielectric breakdown of gate oxides: physics and experiments / Ernest Y. Wu, Rolf-Peter Vollertsen, and Jordi Suñé -- Negative bias temperature instabilities in pMOSFET devices / Giuseppe LaRosa -- Hot carriers / Stewart E. Rauch, III -- Stress-induced voiding / Timothy D. Sullivan -- Electromigration / Timothy D. Sullivan.
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讀者標籤：
- 系統號： 005071728 | 機讀編目格式
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