資料來源:
三民書局
Silicon micromachining
- 作者： Elwenspoek, M. (Miko), 1948-
- 其他作者：
- 出版： Cambridge, U.K. ;New York : Cambridge University Press
- 版本：1st pbk. ed.
- 叢書名： Cambridge studies in semiconductor physics and microelectronic engineering7
- 主題： Silicon , Micromachining , Etching.
- ISBN： 0521607671 (pbk) 、 9780521607674 (pbk)
- 資料類型: 圖書
- 內容註: Includes bibliographical references and index. "First published 1998"--T.p. verso.
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讀者標籤：
- 系統號： 005030962 | 機讀編目格式
館藏資訊
This comprehensive book provides an overview of the key techniques used in the fabrication of micron-scale structures in silicon. Recent advances in these techniques have made it possible to create a new generation of microsystem devices, such as microsensors, accelerometers, micropumps, and miniature robots. The authors underpin the discussion of each technique with a brief review of the fundamental physical and chemical principles involved. They pay particular attention to methods such as isotropic and anisotropic wet chemical etching, wafer bonding, reactive ion etching, and surface micromachining. There is a special section on bulk micromachining, and the authors also discuss release mechanisms for movable microstructures. The book is a blend of detailed experimental and theoretical material, and will be of great interest to graduate students and researchers in electrical engineering and materials science whose work involves the study of micro-electromechanical systems (MEMS).