資料來源:
三民書局
Plasma processes for semiconductor fabrication
- 作者： Hitchon, W. Nicholas G.
- 出版： Cambridge ;New York : Cambridge University Press
- 叢書名： Cambridge studies in semiconductor physics and microelectronic engineering8
- 主題： Semiconductors--Etching , Plasma etching
- ISBN： 9780521591751 (hbk): US$85.00 、 0521591759 (hbk): US$85.00 、 9780521018005 (pbk) 、 0521018005 (pbk)
- 資料類型: 圖書
- 內容註: Includes bibliographical references (p. 205-211) and index.
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讀者標籤：
- 系統號： 005007844 | 機讀編目格式
館藏資訊
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.